MOCVD of titanium dioxide on the basis of new precursors-Reference-Cited by-同舟云学术

MOCVD of titanium dioxide on the basis of new precursors

Published:2002-05 Issue:1 Volume:303 Page:64-68
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Leistner T.,Lehmbacher K.,Härter P.,Schmidt C.,Bauer A.J.,Frey L.,Ryssel H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. Neue Dielektrika für Gbit-Speicherchips;Hönlein;Phys. Bl. (Weinheim),1999

2. N.W. Huber, dissertation, Technische Universität München, 1994

3. C. Schmidt, E.P. Burte, MOCVD of ferroelectric thin films, in: M.D. Allendorf, C. Bernard (Eds.), Chemical Vapor Deposition, ECS Proceedings 97–25, 1997, p. 1055

4. H. Roth, dissertation, Erlangen, 1999

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