Reactivity patterns of stibine and trisdimethylaminoantimony precursors for chemical beam epitaxial growth and etching
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference11 articles.
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3. Single source precursor-based HV-MOCVD deposition of binary group 13-antimonide thin films;Surface and Coatings Technology;2007-09
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