A statistical thermodynamic model for oxygen segregation during Czochralski growth of silicon single crystals
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference20 articles.
1. Modelling point defect dynamics in the crystal growth of silicon
2. Investigations on the correlation between growth rate and gate oxide integrity of Czochralski-grown silicon
3. Oxygen transport mechanism in Si melt during single crystal growth in the Czochralski system
4. Oxygen transport from a silica crucible in Czochralski silicon growth
5. Characterization of complexities in Czochralski crystal growth by nonlinear forecasting
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of heater structure on oxygen concentration in large diameter n-type Czochralski silicon study using numerical simulation;Applied Thermal Engineering;2024-12
2. Reduction of oxygen concentration by heater design during Czochralski Si growth;Journal of Crystal Growth;2018-02
3. Mass transfer behaviors of oxygen during cold crucible continuous casting silicon;International Journal of Heat and Mass Transfer;2016-09
4. A model for distribution of oxygen in multicrystalline silicon ingot grown by directional solidification;Solar Energy Materials and Solar Cells;2007-11
5. Extended defects in nitrogen-doped Czochralski silicon during diode process;Physica B: Condensed Matter;2004-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3