Improvement of crystalline quality of GaAsyP1−x−yNx layers with high nitrogen compositions at low-temperature growth by atomic hydrogen irradiation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference20 articles.
1. Optoelectronic Devices and Material Technologies for Photo-Electronic Integrated Systems
2. Gas-Source Molecular Beam Epitaxy of $\bf GaN_{\ninmbi x}As_{1-{\ninmbi x}}$ Using a N Radical as the N Source
3. Tensile strain relaxation in GaNxP1−x (x≤0.1) grown by chemical beam epitaxy
4. K. Samonji, H. Yonezu, K. Ojima, Y. Fujimoto, N. Ohshima, Proceedings of the Second International Symposium on Blue Laser and Light Emitting Diodes, Chiba, 1998, p. 314.
5. Control of N Content of GaPN Grown by Molecular Beam Epitaxy and Growth of GaPN Lattice Matched to Si(100) Substrate
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