Growth behavior of titanium boride films deposited on (100) Si by dual-electron-beam evaporation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference22 articles.
1. Structure and physical features of the rare-earth borides
2. A review of the present state of art in hard coatings grown from the vapor phase
3. The chemical vapor deposition of TiB2 on graphite
4. The composition and oxidation resistance of coatings deposited on hard carbide alloys using TiB2
5. The behavior of TiB2 thin film electrodes in polycrystalline silicon thin film solar cells
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1. Study of Cadmium Zinc Telluride Thin Film Characterization Fabricated From Two-Source Evaporation Method;Encyclopedia of Materials: Electronics;2023
2. Characterization of Boride Layer Formed on Ti–6Al–4V Alloy by Electron Beam Evaporation Technique;Physics of Metals and Metallography;2020-12
3. Growth kinetics and mechanical characterization of boride layers formed on β-type Ti-45Nb alloy;Surface and Coatings Technology;2018-10
4. Thermal stability and interfacial reaction of TiBx films deposited on (100)Si by dual-electron-beam evaporation;Journal of Crystal Growth;2002-12
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