PIXE measurements of Kr-sputtered TiN coatings

Author:

Osipowicz Thomas,Corts Thilo,Lieb Klaus-Peter,Bergmeister Franz-Josef

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference24 articles.

1. Sputtering from atomic-collision cascades

2. Plasma Surface Engineering;Bolse,1989

3. Sputtering of TiN coatings during ion beam mixing

4. these Proceedings First Eur. Conf. on Accelerators in Applied Research and Technology;Bolse,1990

5. A comparison between pixe and rbs thin film thickness measurements in binary targets

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1. Analysis of photon emission induced by light and heavy ions in time-of-flight medium energy ion scattering;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2018-02

2. Low energy PIXE: advantages, drawbacks, and applications;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-09

3. Thickness measurement of titanium nitride layers on steel using PIXE and proton backscattering;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1994-03

4. Xenon ion beam mixing in Ni3N/Al bilayers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-05

5. Ion beam induced modifications of TiN and Ti films on Al-3% Mg substrates;Applied Physics A Solids and Surfaces;1992-01

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