Author:
Thomae R.W.,Seiler B.,Bender H.,Brutscher J.,Günzel R.,Halder J.,Klein H.,Müller J.,Sarstedt M.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference6 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Proc. 1st Int. Workshop on Plasmas-Based Ion Implantation,1994
3. Shallow junctions for 0.1 μm n-type metal–oxide semiconductor devices
4. N. Cheung, Proc. IIT94, Catania, to be published in Nucl. Instr. and Meth.
Cited by
10 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献