Focused ion beam lithography-Reference-Cited by-同舟云学术

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Focused ion beam lithography

Published:1992-03 Issue:1-4 Volume:65 Page:40-49
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Gamo Kenji

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference30 articles.

1. X‐ray lithography at ∠100 Å linewidths using x‐ray masks fabricated by shadowing techniques

2. 8 nm Wide Line Fabrication in PMMA on Si Wafers by Electron Beam Exposure

3. Ion‐beam sensitivity of polymer resists

4. S. Matsui, Y. Kojima and Y. Ochiai, J. Vac. Sci. Technol. (to be published).

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3. Oxygen-Permeable Films for Continuous Additive, Subtractive, and Hybrid Additive/Subtractive Manufacturing;3D Printing and Additive Manufacturing;2020-10-01

4. Scratch on Polymer Materials Using AFM Tip-Based Approach: A Review;Polymers;2019-09-29

5. Optical properties of Tamm states in metal grating-one dimensional photonic crystal structures;Nanophotonics VII;2018-05-04

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