The use of negative ions to enhance beam currents at low energies in an MeV ion implanter-Reference-Cited by-同舟云学术

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The use of negative ions to enhance beam currents at low energies in an MeV ion implanter

Published:1991-04 Issue:1-4 Volume:55 Page:207-210
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

O'Connor John P.,Mack Michael E.,Renau Anthony,Tokoro Nobuhiro

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Use of Negative Ions in Ion Implantation with Tandem High Energy Accelerators;MRS Proceedings;1993

2. Ion Beams in Prospect;Ion Implantation Technology–92;1993

3. The beam performance of the Genus G-1500 ion implanter;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04

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