New approaches to charging control-Reference-Cited by-同舟云学术

New approaches to charging control

Published:1991-04 Issue:1-4 Volume:55 Page:97-103
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Strain Julie A.,Tanaka Yoichiro,White Nicholas R.,Woodward Richard J.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference6 articles.

1. Large Ion Beams;Forrester,1988

2. these Proceedings 8th Int. Conf. on Ion Implantation Technology;White,1991

3. these proceedings 8th Int. Conf. on Ion Implantation Technology;Ito,1991

4. Principles of Plasma Diagnostics;Hutchinson,1987

5. Plasma Diagnostic Techniques;Chen,1965

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

2. Effect of external bias potential on secondary charged emissions from polycarbonate by C1+ and C8+ bombardments;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-05

5. Charging damage in a hybrid parallel-scanning medium-eurrent ion implanter;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-02