Growth of ultrathin alumina films on W(110)-Reference-Cited by-同舟云学术

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Growth of ultrathin alumina films on W(110)

Published:1995-06 Issue:2-3 Volume:100 Page:411-416
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Günster J.,Brause M.,Mayer Th.,Hitzke A.,Kempter V.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference24 articles.

1. Epitaxial growth of ultrathin Al2O3 films on Ta(110)

2. Ionization of Solids by Heavy Particles;Niehaus,1993

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Initial and Final State Effects in the Ultraviolet and X-ray Photoelectron Spectroscopy (UPS and XPS) of Size-Selected Pdn Clusters Supported on TiO2(110);The Journal of Physical Chemistry C;2015-03-05

2. Growth of Al on a W(110) surface;Thin Solid Films;2012-07

3. Ultra thin Al film on the W(110) surface;Surface Science;2010-09

4. ULTRATHIN Al FILM ON THE W(100) SURFACE;Modern Physics Letters B;2009-03-10

5. Strained single-crystal Al2O3 grown layer by layer on Nb (110) thin films;Applied Physics Letters;2007-06-11

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