Comparison of BC and MD simulations of low-energy ion implantation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference8 articles.
1. Collision cascades in Cu, Au and Cu3Au: a comparison between molecular dynamics and the binary collision approximation
2. Bulk atomic relocation in low-energy collision cascades in silicon: Molecular Dynamics versus Monte Carlo simulations
3. Crystal-trim and its application to investigations on channeling effects during ion implantation
4. Computer Simulation of Channeling Effects in Ion Implantation
5. Modelling of layer-by-layer sputtering of Si(111) surfaces under irradiation with low-energy ions
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