Subject
Instrumentation,Nuclear and High Energy Physics
Reference29 articles.
1. J. Hutcheson, VLSI Research Inc., San Jose, CA.
2. CMOS — The emerging VLSI technology
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of Ion Implantation on the Corrosion Behavior of Lead and a Lead‐Antimony Alloy;Journal of The Electrochemical Society;1994-10-01
2. Ion implantation challenges in the drive towards 64 Mb and 256 Mb memory cell type devices;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
3. The Present State of Ion Implantation Equipment;Physica Status Solidi (a);1989-04-16
4. Rapid isothermal processing;Journal of Applied Physics;1988-04-15