Author:
Spinelli P.,Cartier A.M.,Bruel M.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference7 articles.
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Cited by
12 articles.
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1. Evaluation of electron beam stabilization for ion implant processing;SPIE Proceedings;1999-06-11
2. Depth Profiles of Medium Energy Phosphorus Implants into Silicon;MRS Proceedings;1995
3. MeV Boron Implantation and Masking;MRS Proceedings;1993
4. Axial channeling of boron ions into silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-04
5. Orientation Phenomena in MeV Implants of P IN Si;Crucial Issues in Semiconductor Materials and Processing Technologies;1992