Reflection and self-sputtering of nickel at oblique angles of ion incidence
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference9 articles.
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1. Foundations of atomic-level plasma processing in nanoelectronics;Plasma Sources Science and Technology;2022-10-01
2. Evaluation of nickel self-sputtering yields by molecular-dynamics simulation;Journal of Vacuum Science & Technology A;2021-07
3. Molecular dynamics simulations of ion self-sputtering of Ni and Al surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-05
4. Angular dependence of the sputtering yield of rough beryllium surfaces;Journal of Nuclear Materials;1999-02
5. Experimental investigation of the angular dependence of Be self-sputtering;Journal of Nuclear Materials;1995-04
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