Application of the ERD method for hydrogen determination in silicon (oxy) nitride thin films prepared by ECR plasma deposition
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference10 articles.
1. The role of hydrogen in silicon nitride and silicon oxynitride films
2. Hydrogen incorporation in silicon (oxy)nitride thin films
3. Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method
4. Low-Temperature Deposition of Hydrogen-Free Silicon Oxynitride without Stress by the Remote Plasma Technique
5. Damage-free passivation of InAlAs/InGaAs HFETs by use of ECR-deposited SiN
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