New development in ion implantation and RTP equipment for high productivity

Author:

McKenna Charles M.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference21 articles.

1. See Proceedings of previous Ion Implantation Equipment and Technique Conferences: Trento. Radiat. Eff. 44; Kingston, Nucl. Instr. and Meth. 189; Berchtesgaden, Springer Series in Electrophys. 11; Smuggglers Notch, Nucl. Instr. and Meth. B6; Berkeley, Nucl. Instr. and Meth. B21.

2. these Proceedings 7th Int. Conf. on Ion Implantation Technology;Liebert,1989

3. these Proceedings 7th Int. Conf. on Ion Implantation Technology;Satoh,1989

4. these Proceedings 7th Int. Conf. on Ion Implantation Technology;Hertel,1989

5. A. Delforge, T. Mickols, A. Bhargava and R. Hertel, presented at this Conference.

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Ion beam implantation by expanding instead of scanning;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-12

2. Implantation-equipment data management for cost reduction, equipment optimization and process enhancement;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04

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