Large area ion and plasma beam sources-Reference-Cited by-同舟云学术

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Large area ion and plasma beam sources

Published:1996-06 Issue:1-4 Volume:113 Page:8-15
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Waldorf J.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference33 articles.

1. Handbook of Ion Beam Processing Technology,1989

2. Broad-beam ion source technology and applications

3. Ion milling (ion‐beam etching), 1954–1975: A bibliography

4. Modification on Thin Film Properties by Ion Bombardment During Deposition;Harper,1984

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of Ar incident energy and Ar incident angle effects on surface roughness of Cu metallic thin film in ion assisted deposition;Computational Materials Science;2006-12

2. Zinc/manganese multilayer coatings for corrosion protection;Thin Solid Films;2004-07

3. Broad fast neutral molecule beam sources for industrial-scale beam-assisted deposition;Surface and Coatings Technology;2002-07

4. Using masks to obtain uniform ion etch rates;Review of Scientific Instruments;2002-04

5. Composition and chemical structure characteristics of CN layers prepared by different plasma assisted techniques;Solid State Ionics;2001-05

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