Study of implantation damage ranges in metals at temperatures ranging from 5 to 300 K
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference14 articles.
1. Ion Implantation in Semiconductors and other Materials;Linker,1973
2. Radiation damage in copper single crystals
3. Lattice damage in single crystals of Cu after self-implantation studied by channeling
4. Deep radiation damage in metals after ion implantation
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