Simulation of ion beam assisted deposition of layers on metals-Reference-Cited by-同舟云学术

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Simulation of ion beam assisted deposition of layers on metals

Published:1996-07 Issue:1-4 Volume:115 Page:505-507
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Komarov F.F.,Komarov A.F.,Mironov A.M.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference6 articles.

1. Spatial distribution of energy deposited in a cascade of atomic collisions in solids;Burenkov,1985

2. Ion implantation distributions in inhomogeneous materials

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomistic Simulation of the Ion-Assisted Deposition of Silicon Dioxide Thin Films;Nanomaterials;2022-09-19

2. Electrical properties of contacts covered with multicomponent coatings by the dynamic ion mixing;Vacuum;2005-05

3. Single-ion-beam experimental setup for combined implantation and deposition;Technical Physics;2003-05

4. Ion beam assisted deposition of metal layers using a novel one beam system;Vacuum;2003-03

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