Pulsed particle beam treatment of implanted silicon
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference7 articles.
1. Sources of high power ion beams for technological applications
2. Ion beam annealing of semiconductors
3. Pulsed ion-beam melting of silicon
4. Positron Annihilation and Profiles of Radiation Damages in GaAs and Si Crystals Irradiated by Supercurrent Proton or Electron Beams
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3. Nanosecond-Pulse Annealing of Heavily Doped Ge:Sb Layers on Ge Substrates;Russian Microelectronics;2018-09
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