An improved empirical formula for pumping speeds of ion pumps in the high magnetic field mode

Author:

Suetsugu Y.,Nakagawa M.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Analysis of electron dynamics in non-ideal Penning traps;Physics of Plasmas;2012-06

2. Optimization of cell geometry for a conventional sputter ion pump by a particle-in-cell simulation;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-05

3. AES investigation of anode deposits in magnetron-type sputter ion pump;Applied Surface Science;2005-06

4. Developments in the vacuum systems of AGS-RHIC;Vacuum;1995-08

5. Pumping behavior of ion pump elements at high and misaligned magnetic fields;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1995-05

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