High resolution photoemission study of atomic Cl adsorption on Cu(001)
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference7 articles.
1. Electronic properties of adsorbed layers of nitrogen, oxygen, and sulfur on copper (100)
2. High-resolution photoemission study of adatom bonding effects: Cl (√2 × √2) R 45° on Cu (100)
3. Photoemission and the Electronic Properties of Surfaces,1978
4. High-resolution normal and near-normal ultraviolet photoemission from Cu(100) and Cu(111) surfaces
5. Surface electronic structure of the Cu(111)/Na adsorption system
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1. Chemisorbed halogen adlayers on Fe(110): Electronic band structure and surface geometry;Surface Science;1991-07
2. Ups of thiols and disulfides adsorbed on Cu(410): CH3SH, C2H5SH, C3H7SH, (CH3S)2, (C2H5S)2, (C3H7S)2;Journal of Electron Spectroscopy and Related Phenomena;1990-01
3. UPS of O2 and H2S adsorbed on Cu(410): Band resolution through fractional difference spectra;Surface Science;1989-01
4. Halogen adsorption on solid surfaces;Progress in Surface Science;1988-01
5. A review of the halogen adsorption process on metal surfaces;Critical Reviews in Solid State and Materials Sciences;1987-01
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