Recent applications of compositional depth profiling by secondary ion mass spectrometry-Reference-Cited by-同舟云学术

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Recent applications of compositional depth profiling by secondary ion mass spectrometry

Published:1990-01 Issue:4-6 Volume:41 Page:1330-1334
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Jackman J.A.,Jackman T.E.,Rousseau P.,Weaver L.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference40 articles.

1. Laser Direct Writing of Materials

2. Secondary Ion Mass Spectrometry: Concepts, Instrumental Aspects, Applications and Trends;Benninghoven,1987

3. Fundamentals of Surface and Thin Film Analysis;Feldman,1986

4. Modern Techniques of Surface Analysis;Woodruff,1986

5. Secondary Ion Mass Spectrometry SIMS V,1986

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic mass spectrometry;Analytical Chemistry;1992-06-15

2. Atomic Spectrometry Update—Clinical and Biological Materials, Foods and Beverages;J. Anal. At. Spectrom.;1992

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