Composition of thin films deposited by magnetron sputtering of a CuSn alloy target
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference11 articles.
1. The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processes
2. Effect of target temperature on surface composition changes of Cu−Ni alloys during Ar ion bombardment
3. On the role of recoil implantation in altering the stoichiometry of a bombarded solid
4. Surface enrichment of copper due to keV Xe sputtering of an Al‐Cu mixture
5. Changes in alloy surface composition induced by low energy ion bombardment
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1. Reactive sputtering of Cu2ZnSnS4 thin films — Target effects on the deposition process stability;Surface and Coatings Technology;2014-02
2. The phase and microstructure of CrAlN films deposited by pulsed dc magnetron sputtering with synchronous and asynchronous bipolar pulses;Thin Solid Films;2011-10
3. Surface topography and sputtering behaviour of Cu–6Ag and Cu–1OSn in different plasma atmospheres;Materials Science and Technology;1998-05
4. Physical parameters affecting deposition rates of binary alloys in a magnetron sputtering system;Vacuum;1998-02
5. Glow discharge and sputtering characteristics of copper alloys;Vacuum;1996-09
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