Computer simulation of energy-angle distributions of ions generated in the cathode fall of a glow discharge
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference20 articles.
1. Chemical composition of soft vacuum electron beam assisted chemical vapor deposition of silicon nitride/oxynitride films versus substrate temperature
2. Effects of process parameters on the ionization in triode ion plating
3. Calculations for the Distribution Function of Energetic Electrons in a Helium Hollow Cathode Glow Discharge with the Monte Carlo Method
4. A simulation of electron motion in the cathode sheath region of a glow discharge in helium
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1. Fe and Ti cathodes sputtering by oxygen plasma in DC glow discharges;Vacuum;2009-05
2. Numerical study of the sputtering in a dc magnetron;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-01
3. Application of Monte Carlo simulation to the research of ions transport plasma sheaths of glow discharge;Acta Physica Sinica;2004
4. Role of the fast Ar atoms, Ar+ ions, and metastable Ar atoms in a hollow cathode glow discharge: Study by a hybrid model;Journal of Applied Physics;2003-08-15
5. Monte Carlo simulation of the concentration distribution of sputtered cathode material in glow discharge plasma;Vacuum;2001-08
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