Radio frequency plasma sputter type heavy negative ion source-Reference-Cited by-同舟云学术

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Radio frequency plasma sputter type heavy negative ion source

Published:1993-03 Issue:3-4 Volume:44 Page:203-207
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Ishikawa Junzo,Tsuji Hiroshi,Okada Yukio,Shinoda Masanobu,Gotoh Yasuhito

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference19 articles.

1. Neutral and ionized alkaline metal bombardment type heavy negative ion source (NIABNIS)

2. Proceedings of the Symposium on Negative Ion Sources and Their Application;Tsuji,1988

3. Negative ion source (NIABNIS) and preparation of transparent carbon films by negative carbon ion beam deposition

4. Proceedings of the 6th International Conference on Ion and Plasma Assisted Techniques;Tsuji,1987

5. A heavy negative ion sputter source: Production mechanism of negative ions and their applications

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Gallium ion extraction from a plasma sputter-type ion source;Review of Scientific Instruments;2010-02

2. Surface modification by negative-ion implantation;Surface and Coatings Technology;2009-06

3. Negative-ion source applications (invited);Review of Scientific Instruments;2008

4. High-intensity negative ion sources for material science applications;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2007-08

5. Negative-Ion Formation Processes and Sources;Electrostatic Accelerators;2005

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