Author:
Mladenov Georgy M.,Seyfarth Harald
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference14 articles.
1. Electron Beam Technology in Microelectronic Fabrication;Brewer,1980
2. Dry development of ion beam exposed PMMA resist
3. G Mladenov, V Orlinov and R Dimitrova, Bulgarian patent No 19539 (1974).
4. Self‐developing resist with submicrometer resolution and processing stability
5. Proc Third Microelectronics Conf of the Soc Countries;Valiev,1982
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献