An altered layer model for ion assisted deposition under net sputtering erosion conditions-Reference-Cited by-同舟云学术

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An altered layer model for ion assisted deposition under net sputtering erosion conditions

Published:1988-01 Issue:2 Volume:38 Page:117-121
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Carter G,Katardjiev IV,Nobes MJ

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference31 articles.

1. Ion Bombardment Modification of Surfaces. Fundamentals and Applications;Harper,1984

2. Theory of thin‐film orientation by ion bombardment during deposition

3. Erosion and Growth of Solids Stimulated by Atom and Ion Beams;Kay,1986

4. Ion beam epiplantation

5. Materials Res Soc Proc Symp A;Herbots,1985

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomistic Film Growth and Some Growth-Related Film Properties;Handbook of Physical Vapor Deposition (PVD) Processing;2010

2. Ion-induced nitridation of GaAs(1 0 0) surface;Applied Surface Science;2001-04

3. Auger electron spectroscopy and x-ray photoelectron spectroscopy analysis of angle of incidence effects of ion beam nitridation of GaAs;Journal of Materials Research;1998-07

4. Atomistic Film Growth and Some Growth-Related Film Properties;Handbook of Physical Vapor Deposition (PVD) Processing;1998

5. XPS studies on nitridation of InP(100) surface by ion beam bombardment;Journal of Physics D: Applied Physics;1996-12-14

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