Study of plasma CVD silicon-germanium films using electron beam techniques
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference19 articles.
1. Amorphous Semiconductors, Technologies and Devices;Shirahata,1982
2. Structural, electrical, and optical properties ofa-Si1−xGex:H and an inferred electronic band structure
3. Photoelectric and structural properties of a-Si1-xGex: H alloys prepared using Si2H6 and GeH4
4. The Physics and Application of Amorphous Semiconductors;Madan,1988
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Morphological evolution of self-assembled SiGe islands based on a mixed-phase pre-SiGe island layer grown by ion beam sputtering deposition;Applied Surface Science;2015-02
2. Hydrogenated amorphous silicon germanium alloy with enhanced photosensitivity prepared by plasma enhanced chemical vapor deposition at high temperature;Vacuum;2013-03
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