X-ray crystal structures of bis-2,2,6,6-tetramethylheptane-3,5-dionatolead(II) and bis-2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionatolead(II): compounds important in the metalorganic chemical vapour deposition (MOCVD) of lead-containing films-Reference-Cited by-同舟云学术

X-ray crystal structures of bis-2,2,6,6-tetramethylheptane-3,5-dionatolead(II) and bis-2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionatolead(II): compounds important in the metalorganic chemical vapour deposition (MOCVD) of lead-containing films

Published:1999-04 Issue:11 Volume:18 Page:1641-1646
ISSN:0277-5387
Container-title:Polyhedron
language:en
Short-container-title:Polyhedron

Author:

Malik M.Azad,O’Brien Paul,Motevalli Majid,Jones Anthony C.,Leedham Tim

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry

Reference59 articles.

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3. Solution Deposition of Ferroelectric Thin Films

4. Process Integration for Nonvolatile Ferroelectric Memory Fabrication

5. Electroceramic Thin Films Part II: Device Applications

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