1. Introduction to Chemical Vapor Deposition. Chemical Vapor Deposition;Creighton,2001
2. Radhakrishnan, G; Adams, PM, US8,388,924, The Aerospace Corporation, Mar. 5, 2013.
3. Li, X; Ning, H, US20140170317, Bluestone Global Technology Ltd., Dec. 17, 2012.
4. Colombo, L; Li, X; Ruoff, RS, US8,470,400, Texas Instruments Inc and University of Texas System, Oct. 21, 2009.
5. Duan, X; Zhou, H, US20150337458, University of California, Jan. 9, 2013.