Bias voltage influence on surface morphology of titanium nitride synthesized by dynamic nitrogen and titanium plasma immersion ion implantation and deposition-Reference-Cited by-同舟云学术

Bias voltage influence on surface morphology of titanium nitride synthesized by dynamic nitrogen and titanium plasma immersion ion implantation and deposition

Published:2002-11 Issue:1-2 Volume:337 Page:236-240
ISSN:0921-5093
Container-title:Materials Science and Engineering: A
language:en
Short-container-title:Materials Science and Engineering: A

Author:

Tian Xiubo,Wang Langping,Fu Ricky King-Yu,Chu Paul K

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference16 articles.

1. Atomic force microscopy study on topography of films produced by ion‐based techniques

2. Synthesis of Ti-N thin films prepared by dynamic ion mixing technique and their mechanical properties

3. Wear reduction of TA6V produced by SiC coatings deposited by dynamic ion mixing

4. Properties of titanium nitride fabricated on stainless steel by plasma-based ion implantation/deposition

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3. TiN Coatings on Titanium Substrates Using Plasma Assisted Ion Implantation;Journal of Physics: Conference Series;2015-03-24

4. Effect of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating and simulation of pulsed plasma sheath dynamics;Thin Solid Films;2012-10

5. Friction and Wear Behaviors and Rolling Contact Fatigue Life of TiN Film on Bearing Steel by Plasma Immersion Ion Implantation and Deposition Technique;Advanced Tribology;2009