Boron carbide films deposited by a magnetron sputter–ion plating process: film composition and tribological properties-Reference-Cited by-同舟云学术

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Boron carbide films deposited by a magnetron sputter–ion plating process: film composition and tribological properties

Published:2000-04 Issue:3-6 Volume:9 Page:489-493
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Reigada D.C,Prioli R,Jacobsohn L.G,Freire F.L

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Structures and properties of disordered boron carbide coatings generated by magnetron sputtering

2. Subplantation effect in magnetron sputtered superhard boron carbide thin films

3. Structure Determination of B4C and SiC Thin Films Via Synchrotron High-Resolution Diffraction

4. Microhardness study of amorphous hydrogenated boron carbide deposited on a cathode substrate by plasma deposition

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3. B₄C Composites with a TiB₂-C Core–Shell Microstructure Produced by Self-Propagating High-Temperature Synthesis-Assisted Spark Plasma Sintering;The Journal of Physical Chemistry C;2022-11-18

4. Effect of Negative Bias Voltage on Tribological Properties under High Relative Humidity Environment and Corrosion Resistance of Boron Carbide Coatings;Metals;2021-09-24

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