The effect of nitrogen addition to Ar/CH4 plasmas on the growth, morphology and field emission of ultrananocrystalline diamond-Reference-Cited by-同舟云学术

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The effect of nitrogen addition to Ar/CH4 plasmas on the growth, morphology and field emission of ultrananocrystalline diamond

Published:2002-01 Issue:1 Volume:11 Page:43-48
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Corrigan T.D.,Gruen D.M.,Krauss A.R.,Zapol P.,Chang R.P.H.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Cold field emission from CVD diamond films observed in emission electron microscopy

2. Quantum photoyield of diamond(111)—A stable negative-affinity emitter

3. Argon and hydrogen plasma interactions on diamond (111) surfaces: Electronic states and structure

4. Compensation effects in nitrogen‐doped diamond thin films

5. Investigations of the incorporation of B, P and N into CVD-diamond films by secondary ion mass spectrometry

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1. Enhancement of Field Emission Properties in Ultra-Nano-Crystalline Diamond Films Upon 100 Kev Nickel Ion Implantation;SSRN Electronic Journal;2022

2. Cryogenic operation of planar ultrananocrystalline diamond field emission source in SRF injector;Applied Physics Letters;2021-02-01

3. Dynamic graphitization of ultra-nano-crystalline diamond and its effects on material resistivity;Journal of Applied Physics;2020-12-21

4. Effect of the admixture of N2 to low pressure, low temperature H2-CH4-CO2 microwave plasmas used for large area deposition of nanocrystalline diamond films;Journal of Physics D: Applied Physics;2020-08-17

5. Submicrometer ultrananocrystalline diamond films processed in oxygen and hydrogen plasma and analyzed by UV-vis spectroscopy: Thickness and optical constant results;Surface Science Spectra;2020-08-07

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