Data preparation and fabrication of DOE using electron-beam lithography

Author:

Babin S.V.,Danilov V.A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. X-ray Microscopy,1984

2. Electron beam lithography of optical elements for X-ray range;Babin;Proc. SPIE,1992

3. The generation of optical elements for radiation focusing into an arbitrary curve;Danilov;Sov. Tech. Phys. Lett.,1982

4. The solution of inverse optical problem for focusing laser radiation into an arbitrary curve;Goncharskii;Dokl. Akad. Nauk USSR,1985

5. Danilov, V. A. et al., 1992. Device for laser treatment of an object. US Patent No 5, 103, 073, April 7, 1992.

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