Optical characteristics of sputtered tantalum oxynitride Ta(N,O) films
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science
Reference12 articles.
1. Properties of TaNx films as diffusion barriers in the thermally stable Cu/Si contact systems
2. Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films
3. Study of nanocrystalline Ta(N,O) diffusion barriers for use in Cu metallization
4. Crystallographic and morphological characterization of reactively sputtered Ta, TaN and TaNO thin films
5. O. Atsushi, S. Kazutomi, C. Kiyoshi, US Patent US5560998 (1996).
Cited by 37 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Study of epsilon-near-zero response in Al substituted titanium oxynitride thin films using computational and experimental investigations;Materials Science and Engineering: B;2023-05
2. The effect of the Ar/N2 gas ratio on the structure and properties of Ta-Si-N coatings produced by magnetron sputtering of TaSi2 target;Surfaces and Interfaces;2023-04
3. Influence of Oxygen Flow Rate on the Properties of FeOXNY Films Obtained by Magnetron Sputtering at High Nitrogen Pressure;Coatings;2022-07-25
4. Optical properties investigation of reactively sputtered tantalum oxynitride films;Materials Today: Proceedings;2022
5. Nanomechanical and Nanotribological Properties of Nanostructured Coatings of Tantalum and Its Compounds on Steel Substrates;Nanomaterials;2021-09-15
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3