A “Fraternal Twin” atomic layer deposition process for nickel carboxylate and nickel carbide-Reference-Cited by-同舟云学术

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A “Fraternal Twin” atomic layer deposition process for nickel carboxylate and nickel carbide

Published:2022-03 Issue: Volume:137 Page:109235
ISSN:1387-7003
Container-title:Inorganic Chemistry Communications
language:en
Short-container-title:Inorganic Chemistry Communications

Author:

Du Liyong,He Dongmei,Ding Yuqiang

Funder

Jiangsu Province Natural Science Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry

Reference42 articles.

1. Nickel-Based Electrocatalysts for Energy Related Applications: Oxygen Reduction, Oxygen Evolution, and Hydrogen Evolution Reactions;Vij;ACS Catal.,2017

2. Large-scale mechanical preparation of graphene containing nickel, nitrogen and oxygen dopants as supercapacitor electrode material;Liu;Chem. Eng. J.,2022

3. Direct Catalytic Conversion of Cellulose into Ethylene Glycol Using Nickel-Promoted Tungsten Carbide Catalysts;Ji;Angew. Chem. Int. Ed.,2008

4. Optimized Ni-based catalysts for methane reforming with O2-containing CO2;Deng;Appl. Catal. B-Environ.,2021

5. Selective electroless nickel deposition on copper as a final barrier/bonding layer material for microelectronics applications;Rohan;Appl. Surf. Sci.,2002

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic Layer Deposition of Molybdenum Carbide Thin Films;Advanced Materials Interfaces;2024-07

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