Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target-Reference-Cited by-同舟云学术

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Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target

Published:1999-01 Issue:3-4 Volume:56 Page:259-269
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Masetti E.,Grilli M.L.,Dautzenberg G.,Macrelli G.,Adamik M.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Principles and operation of an all solid state electrochromic display based on a-“WO3”

2. Handbook of inorganic electrochromic materials;Granqvist,1995

3. Optical switching technology for glazings

4. Electrochromism in Sputtered WO 3 Thin Films

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