Microstructure of epitaxial layers deposited on silicon by ion assisted deposition-Reference-Cited by-同舟云学术

Microstructure of epitaxial layers deposited on silicon by ion assisted deposition

Published:2001-01 Issue:1-4 Volume:65 Page:503-508
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Krinke J,Kuchler G,Brendel R,Artmann H,Frey W,Oelting S,Schulz M,Strunk H.P

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. R. Brendel, A novel process for ultrathin monocrystalline silicon solar cells on glass, Proceedings of the 14th European Photovoltaic Solar Energy Conference, Barcelona, Spain, 1997, p. 1354.

2. Epitaxial Growth on Porous Si for a New Bond and Etchback Silicon‐on‐Insulator

3. N. Sato, S. Ishii, S. Matsumura, M. Ito, J. Nakayama, T. Yonehara, Proceedings of the IEEE International SOI Conference 1998, pp. 14 and 15.

4. S. Oelting, D. Martini, D. Bonnet, Crystalline thin film silicon solar cells by ion-assisted deposition, Proceedings of the 12th E.C. Photovoltaic Specialists Conference, 1994, p. 1815.

5. HREM Investigations of the Agglomeration of Self-Interstitials in Silicon

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