Thin film poly-Si solar cells using PECVD and Cat-CVD with light confinement structure by RIE

Author:

Niira K,Senta H,Hakuma H,Komoda M,Okui H,Fukui K,Arimune H,Shirasawa K

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method

2. K. Niira, H. Senta, H. Hakuma, M. Komoda, H. Okui, K. Fukui, H. Arimune, K. Shirasawa, First International Conference on Cat-CVD Process, 2000, p. 261.

3. M. Komoda, K. Kamesaki, A. Masuda, H. Matsumura, First International Conference on Cat-CVD Process, 2000, p. 163.

4. C. Niikura, S.Y. Kim, B. Drévillon, J.E. Bourée, First International Conference on Cat-CVD Process, 2000, p. 283.

5. Y. Inomata, K. Fukui, K. Shirasawa, Ninth PVSEC, 1996, p. 109.

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