Effect of 150 keV Ti+ ion implantation on the structural, optical, and electrical properties of nonstoichiometric WO2.72 thin films
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
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1. Helium ions irradiation of tantalum-zirconium carbide thin films: The effect of acetylene gas contents;Radiation Physics and Chemistry;2023-07
2. Cobalt ion implantation assisted modifications in luminescence, surface states, structural and morphological properties of MgTiO3 thin films;Applied Physics A;2023-05
3. Influence of implantation assisted Ni doping on structural and optical properties of WO2.72 films;Optical Materials;2023-02
4. Corrigendum to ’Effect of 150 keV Ti− ion implantation on the structural, optical, and electrical properties of nonstoichiometric WO2.72 thin films’: [Materials Research Bulletin 145 (2022) 111566];Materials Research Bulletin;2022-02
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