Electron-beam induced carbon deposition used as a mask for cadmium sulfide deposition on Si(100)-Reference-Cited by-同舟云学术

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Electron-beam induced carbon deposition used as a mask for cadmium sulfide deposition on Si(100)

Published:2001-12 Issue:6 Volume:47 Page:891-897
ISSN:0013-4686
Container-title:Electrochimica Acta
language:en
Short-container-title:Electrochimica Acta

Author:

Djenizian T,Petite B,Santinacci L,Schmuki P

Publisher

Elsevier BV

Subject

Electrochemistry,General Chemical Engineering

Reference41 articles.

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2. Mesoscopic Phenomena in Nanostructures;Averin,1991

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