Fabrication of advanced thin film for high performance display by nanoimprinting process via gallium oxide solution doped tin-Reference-Cited by-同舟云学术

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Fabrication of advanced thin film for high performance display by nanoimprinting process via gallium oxide solution doped tin

Published:2024-05 Issue: Volume:30 Page:685-694
ISSN:2238-7854
Container-title:Journal of Materials Research and Technology
language:en
Short-container-title:Journal of Materials Research and Technology

Author:

Oh Jin Young,Kim Dong Hyun,Yang Da-Bin,Choi Bo-Kyeong,Lee Dong Wook,Park Hong-Gyu^ORCID,Seo Dae-Shik^ORCID

Funder

Korea Institute of Energy Technology Evaluation and Planning

Korea Ministry of Science and ICT

National Research Foundation of Korea

Publisher

Elsevier BV

Reference39 articles.

1. TFT-LCD technology;Katayama;Thin Solid Films,1999

2. Tristable nematic liquid-crystal device using micropatterned surface alignment;Kim;Nature,2002

3. Refractive-index-matched indium–tin-oxide electrodes for liquid crystal displays;Yan;Jpn J Appl Phys,2009

4. Molecular theory of surface tension for liquid crystal;Jyoji;J Phys Soc Jpn,1977

5. Observation of macroscopic collective behavior and new texture in magnetically doped liquid crystals;Chen;Phys Rev Lett,1983

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