Investigation of the microstructure and physical properties of TaSi<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si45.svg" display="inline" id="d1e482"><mml:msub><mml:mrow/><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:math> sintered at high temperature and high pressure-Reference-Cited by-同舟云学术

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Investigation of the microstructure and physical properties of TaSi2 sintered at high temperature and high pressure

Published:2024-03 Issue: Volume:29 Page:3108-3116
ISSN:2238-7854
Container-title:Journal of Materials Research and Technology
language:en
Short-container-title:Journal of Materials Research and Technology

Author:

Yu Yajie,Zhang Zhengang,Xiao Chengxiang,Chen Haihua,Lu Cheng,Ma Jianyi

Funder

National Natural Science Foundation of China

Sichuan University

Publisher

Elsevier BV

Reference50 articles.

1. Mechanical properties of the TaSi2 fibers by nanoindentation;Cui;J Mater Sci Technol,2010

2. Some properties of the phonon spectra of transition metal disilicides VSi2, NbSi2, and TaSi2;Laborde;Solid State Commun,2003

3. Resistivity and magnetoresistance of monocrystalline TaSi2 and VSi2;Gottlieb;Surf Coat Tech,1991

4. Electrical and compositional properties of TaSi2 films;Ravindra;J Electron Mater,2002

5. Silicide thin films and their applications in microelectronics;Murarka;Intermetallics,1995

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