High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference5 articles.
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4. Thermal plasma chemical vapor deposition of Si-based ceramic coatings from liquid precursors;Bouyer;Plasma Chem. Plasma Process.,2001
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