Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers-Reference-Cited by-同舟云学术

Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers

Published:2003-12 Issue:12 Volume:58 Page:2105-2112
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Streli C.,Pepponi G.,Wobrauschek P.,Zöger N.,Pianetta P.,Baur K.,Pahlke S.,Fabry L.,Mantler C.,Kanngießer B.,Malzer W.

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference18 articles.

1. Rigaku hompage: http//www.Rigaku.com/

2. SEMATEC roadmap: http//public.itrs.net/

3. Analysis of Ni on Si-wafer surfaces using synchrotron radiation excited total reflection X-ray fluorescence analysis

4. http://www-project.slac.stanford.edu/ssrltxrf/

5. http://www.esrf.fr/exp_facilities/ID27/index.htm

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