Intraductal Carcinomas of the Salivary Gland
Author:
Publisher
Elsevier BV
Subject
Pathology and Forensic Medicine,Surgery
Reference29 articles.
1. WHO classification of head and neck tumours;El-Naggar,2017
2. Low grade salivary duct carcinoma. A distinctive variant with a low grade histology and a predominant intraductal growth pattern;Delgado;Cancer,1996
3. Intraductal carcinoma of the minor salivary gland;Chen;J Laryngol Otol,1983
4. Low-grade Apocrine Intraductal Carcinoma: Expanding the Morphologic and Molecular Spectrum of an Enigmatic Salivary Gland Tumor;Bishop;Head Neck Pathol,2020
5. NCOA4-RET and TRIM27-RET Are Characteristic Gene Fusions in Salivary Intraductal Carcinoma, Including Invasive and Metastatic Tumors: Is "Intraductal" Correct?;Skalova;Am J Surg Pathol,2019
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. High-grade salivary carcinomas: A current insight on diagnostic pathology and the key to clinical decision making;Seminars in Diagnostic Pathology;2024-07
2. Oncocytoid Salivary Tumors: Differential Diagnosis and Utility of Newly Described Immunohistochemistry;Head and Neck Pathology;2024-03-19
3. High‐grade intraductal carcinoma of the parotid gland harboring CTNNA1::ALK rearrangement: Changes in genetic status using genetic testing during treatment with an ALK inhibitor;Head & Neck;2023-11-29
4. Proceedings of the North American Society of Head and Neck Pathology Companion Meeting, New Orleans, LA, March 12, 2023: Classification of Salivary Gland Tumors: Remaining Controversial Issues?;Head and Neck Pathology;2023-05-15
5. Intraductal Carcinoma: The Carcinoma In Situ of the Salivary Gland;Journal of Craniofacial Surgery;2023-04-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3