Reactive scattering of halogen molecules from $lang;111$rang; surfaces of silicon and germanium: Comparison with oxygenic species-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Reactive scattering of halogen molecules from $lang;111$rang; surfaces of silicon and germanium: Comparison with oxygenic species

Published:1973-02 Issue:2 Volume:28 Page:316-321
ISSN:0021-9517
Container-title:Journal of Catalysis
language:en
Short-container-title:Journal of Catalysis

Author:

MADIX R

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Catalysis

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments;Journal of Physics D: Applied Physics;2009-04-15

2. Adsorption and Desorption Processes;Kinetics of Catalytic Reactions;2005

3. Through the labyrinth of surface reaction mechanism: a personal account, 1964–1992;Surface Science;1994-01

4. Oxygen scattering and initial chemisorption probability on Ge(100);Surface Science;1991-08

5. Atomic versus molecular reactivity at the gas-solid interface: The adsorption and reaction of atomic oxygen on the Si(100) surface;Physical Review B;1990-01-15

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP