Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference8 articles.
1. On the scaling issues and high-k replacement of ultrathin gate dielectrics for nanoscale MOS transistors;Wong;Microelectron. Eng.,2006
2. Lanthanum oxide nanostructured films synthesized using hot dense and extremely non-equilibrium plasma for nanoelectronic device applications;Mangla;J. Mater. Sci.,2014
3. Study of electrical and micro-structural properties of high-k gate dielectric stacks deposited using pulse laser deposition for MOS capacitor applications;Srivastava;J. Mater. Sci.: Mater. Electron.,2014
4. Metal oxide semiconductor capacitors fabricated on Zirconium Oxide high-k gate dielectric nano layers;Mangla;Inter. J. Recent Technol. Eng.,2019
5. Thermal stability and electrical properties of pulsed laser deposited Hf–aluminate thin films for high-k gate dielectric applications;Zhu;J. Phys. D: Appl. Phys.,2005